report

Fig.4 shows the line-profile analysis of out-of-plane (a) and in-plane (b) for GISAXS 2D image (Fing.3). Fig.4 (c) shows relationship between out-of-plane and in-plane intensity of q =2.4 nm-1 obtained from line-profile analysis of 90 o (a : out-of-plane) and 179 o (b : in-plane) for GISAXS 2D image with solvent casting time. The characteristic peak was not observed at 2 min 40 s after the solvent cast. For the 6 min 53 s after solvent cast, the diffraction peak was observed at q = 2.4 nm-1, which assigned to the order structure in acrylonitrile sequence of NBR. The diffraction peak was observed strongly at horizontal (out-of-plane) and vertical (in-plane) direction to the substrate. Azimuthal angle intensity distribution of NBR/SBR blend thin film showed two maximum diffraction peaks at 90 and 179 o. This results indicated that the regular structure of NBR was formed at air/liquid interface during solvent casting on Si substrate from the homogeneous upper layer solution.

I am still doing fine with your compositions. So far so good! Though, I had a hard time. (Hahaha) Don\'t worry, I will finish them. -Teacher Chloe Fig.4 shows the line-profile analysis of out-of-plane (a) and in-plane (b) for GISAXS 2D image (Fing.3). >>Figure 4 shows the line-profile analysis of out-of-plane (a) and in-plane (b) for GISAXS 2D image (fig. 3). Fig.4 (c) shows relationship between out-of-plane and in-plane intensity of q =2.4 nm-1 obtained from line-profile analysis of 90 o (a : out-of-plane) and 179 o (b : in-plane) for GISAXS 2D image with solvent casting time. >>Figure 4 (c) shows the relationship between out-of-plane and in-plane intensity of q=2.4 nm-1 obtained from line-profile analysis of 90 o (a : out-of-plane) and 179 o (b : in-plane) for GISAXS 2D image with solvent casting time. The characteristic peak was not observed at 2 min 40 s after the solvent cast. >>The characteristic peak was not observed for 2 minutes 40 seconds after the solvent cast. For the 6 min 53 s after solvent cast, the diffraction peak was observed at q = 2.4 nm-1, which assigned to the order structure in acrylonitrile sequence of NBR. >>For 6 minutes 53 seconds after solvent cast, the diffraction peak was observed at q = 2.4 nm-1, which assigned to the order structure in acrylonitrile sequence of NBR. The diffraction peak was observed strongly at horizontal (out-of-plane) and vertical (in-plane) direction to the substrate. >>The diffraction peak was strongly observed at horizontal (out-of-plane) and vertical (in-plane) direction to the substrate. Azimuthal angle intensity distribution of NBR/SBR blend thin film showed two maximum diffraction peaks at 90 and 179 o. >>Correct! This results indicated that the regular structure of NBR was formed at air/liquid interface during solvent casting on Si substrate from the homogeneous upper layer solution. >>These results indicated that the regular structure of NBR was formed at air/liquid interface during solvent casting on Si substrate from the homogeneous upper layer solution.